METHOD OF MANUFACTURING NITRIDE SEMICONDUCTOR SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a technique to produce a nitride semiconductor substrate having a planarized surface by a simple method.

SOLUTION: A method of manufacturing a nitride semiconductor substrate includes: a preparation step in which a plate nitride semiconductor crystal 110 is prepared to have a first face 112 and a second face 114 that are opposite side with facing each other and are warped such that the first face 112 forms a convex face and the second face 114 forms a concave face; a supporting step in which the second face 114 side of the plate nitride semiconductor crystal 110 faces toward a plate 200 and the plate nitride semiconductor crystal 110 is supported by the plate 200 with the first face 112 forming a convex face and the second face 114 forming a concave face; and a planarization step in which the first face 112 of the plate nitride semiconductor crystal 110 supported by the plate 200 is planarized.

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