发明名称 |
MEASUREMENT OR INSPECTION APPARATUS AND MEASUREMENT OR INSPECTION METHOD USING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an electron beam type measurement and inspection apparatus and a measurement and inspection method featuring a reduced divergence in electron beam scanning caused by a mirror body current noise. <P>SOLUTION: A measurement or inspection apparatus includes an electron irradiation system which irradiates a subject to be inspected with an electron beam, a mirror body though which an electron beam passes until it irradiates the subject to be inspected after being emitted from the electron irradiation system, a secondary electron detection system which detects secondary electrons generated by irradiating the subject to be inspected with the electron beam which passes through the mirror body, a signal processing system which processes a signal based on the secondary electrons detected by the secondary electron detection system, and correction means which measures a current value flowing in the mirror body when the electron beam emitted from the electron irradiation system passes through the mirror body and corrects the irradiated position of the electron beam based on a relationship between the current value and a predetermined current value and a divergence in beam position. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012049045(A) |
申请公布日期 |
2012.03.08 |
申请号 |
JP20100191631 |
申请日期 |
2010.08.30 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
RI UEN;MAKUUCHI MASAMI;KAWANO HAJIME;MORI WATARU;TAKAHASHI HIROYUKI;ESUMI MAKOTO |
分类号 |
H01J37/09;H01J37/147;H01L21/66 |
主分类号 |
H01J37/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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