METHOD FOR DEPOSITING NANOPARTICLES ON SUBSTRATES

摘要

The present invention is related to a method for depositing nanoparticles on a substrate, wherein the method comprises the steps of: forming a mixture of a precursor and a substrate, said precursor being in a liquid or a solid phase, said substrate being a nanoscopic or microscopic substrate, said mixture being formed outside a reactor after which said mixture is introduced into a reactor, or introducing said precursor and said substrate into a reactor and forming said mixture in said reactor, - exposing said mixture of said precursor and said substrate to a plasma in said reactor, wherein the temperature of the plasma during the step of exposing said mixture of said precursor and said substrate to a plasma is lower than 300°C.