| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a source collector module which is inexpensive, simple and tough. <P>SOLUTION: Grazing incidence collectors (GIC) mirrors M1, M2 are used in a source collector module for generating laser generating plasma (LPP) that emits EUV radiation. LPP is formed by using an LPP target system having a light source portion and a target portion. A pulse laser beam from the light source portion is applied to liquid xenon in the target portion. The GIC mirror is arranged relatively to LPP, receives EUV 30 at an incident end thereof and focuses the received EUV at an intermediate focus point IF adjacent to an emission end thereof. In order to increase the amount of EUV to be supplied to the intermediate focus point and further/or guided to an illuminator at the downstream side, a radiation collection enhancing device having at least one funnel portion is used. <P>COPYRIGHT: (C)2012,JPO&INPIT |
