发明名称 GATE VALVE AND SUBSTRATE PROCESSING APPARATUS EQUIPPED WITH THE SAME
摘要 Agate valve apparatus is disclosed. The gate valve apparatus is provided with a valve casing that includes a first valve seat and a second valve seat, and in which an opening portion is formed; and a closure element that includes a sealing member that contacts the first valve seat to seal the opening portion. In addition, the gate valve apparatus is provided with a shutoff member that contacts the second valve seat to thereby be deformed, so that a space between the opening portion and a sealing member is shut off by the shutoff member when the closure element closes the opening portion. The shutoff member is deformed and continues to contact the second valve seat under normal and high temperature environments when the closure element closes the opening portion.
申请公布号 US2012055400(A1) 申请公布日期 2012.03.08
申请号 US201013258519 申请日期 2010.03.29
申请人 HIROKI TSUTOMU;NOSE MASAAKI;MATSUSHITA MASANAO;NISHIBA TAKEHIRO;TOKYO ELECTRON LIMITED 发明人 HIROKI TSUTOMU;NOSE MASAAKI;MATSUSHITA MASANAO;NISHIBA TAKEHIRO
分类号 H01L21/00;B05C9/00;F16K3/00 主分类号 H01L21/00
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