发明名称 TOPICAL APPLICATOR COMPOSITION AND PROCESS FOR REMOVAL OF RADIONUCLIDES FROM RADIOLOGICALLY CONTAMINATED DERMAL SURFACES
摘要 A topical applicator composition and process are described that decorporate radionuclides from radiologicaily-contaminated dermal surfaces and that further promote healing. The topical applicator includes a decorporation agent mixed with a plasticizing agent that forms a covering when applied to the dermal surface that decorporates radionuclides and minimizes their systemic migration. The topical applicator formulations can be delivered in conjunction with bandages and other application dressings.
申请公布号 WO2012030429(A1) 申请公布日期 2012.03.08
申请号 WO2011US42771 申请日期 2011.07.01
申请人 BATTELLE MEMORIAL INSTITUTE;LEVITSKAIA, TATIANA, G.;THRALL, KARLA, D.;PETERSON, JAMES, M.;FRYXELL, GLEN, E.;TIMCHALK, CHARLES, A.;TARASEVICH, BARBARA, J. 发明人 LEVITSKAIA, TATIANA, G.;THRALL, KARLA, D.;PETERSON, JAMES, M.;FRYXELL, GLEN, E.;TIMCHALK, CHARLES, A.;TARASEVICH, BARBARA, J.
分类号 G21F9/00;A61L15/00;G21F9/28 主分类号 G21F9/00
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