FERROMAGNETIC MATERIAL SPUTTERING TARGET

摘要

Disclosed is a ferromagnetic material sputtering target which is a sintered body sputtering target that is composed of a metal mainly composed of Co and non-metallic inorganic material particles. The ferromagnetic material sputtering target is characterized in that there are a plurality of metal phases having different saturation magnetizations and non-metallic inorganic material particles are dispersed in each metal phase. The objective of the present invention is to provide a ferromagnetic material sputtering target which is used for the formation of a magnetic thin film of a magnetic recording medium, especially for the formation of a magnetic recording layer of a hard disk that utilizes perpendicular magnetic recording system, said ferromagnetic material sputtering target being capable of achieving stable discharge and also being capable of suppressing generation of particles during the sputtering, while achieving stable discharge in a magnetron sputtering apparatus by increasing the leakage magnetic flux of the sputtering target.