CVD-Siemens Monosilane Reactor Process with Complete Utilization of Feed Gases and Total Recycle

摘要

The present invention relates to a monosilane (SiH4) and hydrogen recycle process/system for chemical vapor deposition (CVD) of monosilane-based CVD polysilicon. In particular, the present invention relates to the substantially complete silane utilization and unconverted (from the reactor) contamination-free complete silane and hydrogen recycle process of producing polysilicon chunk materials via the decomposition of gaseous silane precursors.