发明名称 METHOD FOR PRODUCING PHOTOSENSITIVE RESIN AND PHOTOSENSITIVE RESIN COMPOSITION
摘要 The purpose of the present invention is to provide a method for producing a photosensitive resin that has reduced chlorinity, contains fewer metal-corroding components and the like, and is excellent in terms of required properties such as adhesiveness of the cured film, in order to achieve a highly reliable printed circuit board. The method for producing this photosensitive composition is characterized by: introducing a carboxylic acid ester (c) containing a polymerizable unsaturated group to a resin (b) having an extended chain in which some or all of the phenolic hydroxyl groups in a resin (a) having two or more phenolic hydroxyl groups per molecule are extended by a (poly) oxyalkylene group having an alcoholic hydroxyl group on an end, while in the presence of a zinc or zirconium acetylacetonate complex (d), and in the range of 0.2-0.8 equivalents of the polymerizable unsaturated group per 1 equivalent of the alcoholic hydroxyl group in the resin (b); and by reacting the remaining alcoholic hydroxyl groups with a polybasic acid anhydride (e).
申请公布号 WO2012029806(A1) 申请公布日期 2012.03.08
申请号 WO2011JP69647 申请日期 2011.08.30
申请人 SHOWA DENKO K.K.;SAKAMOTO, ATSUSHI;UEI, HIROSHI;OGAWA, KOUJI;KOBAYASHI, MASAYUKI;NISHIGUCHI, SHOUJI 发明人 SAKAMOTO, ATSUSHI;UEI, HIROSHI;OGAWA, KOUJI;KOBAYASHI, MASAYUKI;NISHIGUCHI, SHOUJI
分类号 C08G8/28;C08L63/00;G03F7/027 主分类号 C08G8/28
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