| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition capable of forming a resist coat that can appropriately prevent development defects from occurring. <P>SOLUTION: A radiation-sensitive resin composition includes: (A) a fluorine-containing compound having a group represented by formula (1); and (B) a radiation-sensitive acid generator [wherein, R<SP POS="POST">C</SP>represents an optionally substituted (p+1)-valent aromatic cyclic group, Q represents a connecting group except for one hydrogen atom from a univalent hydrophilic group, R<SP POS="POST">E</SP>represents a hydrocarbon group having 1 to 10 carbon atoms that may contain hydrogen atoms or fluorine atoms, p represents an integer of 1 to 5, with the proviso that p represents 2 to 5, a plurality of Q and R<SP POS="POST">E</SP>each independently have the definition, and "*" represents a bonding hand.]. <P>COPYRIGHT: (C)2012,JPO&INPIT |
