发明名称 BATCH TYPE SUBSTRATE PROCESSING DEVICE
摘要 <p>Disclosed is a batch type substrate processing device. A batch type substrate processing device (1) according to one embodiment of the present invention comprises: a substrate processing unit (400) for processing a substrate (10); transport units (200, 300) for transporting the substrate (10); and a cooling unit (500) for cooling the substrate (10) that has been substrate (10) treated, wherein the substrate processing unit (400) comprises: a chamber (430) providing a space for substrate (10) treating the substrate (10); a boat (440) which is mounted inside the chamber (430), and in which the substrate (10) is loaded in a multilayer; a holder (450) which is mounted on the boat (440) in a multilayer in a attachable/detachable manner, and supports the substrate (10); and a plurality of substrate stands (460) provided on the holder (450) to support the substrate (10).</p>
申请公布号 WO2012030032(A1) 申请公布日期 2012.03.08
申请号 WO2011KR01318 申请日期 2011.02.25
申请人 TERASEMICON CORPORATION;SONG, JONG HO;KANG, HO YOUNG 发明人 SONG, JONG HO;KANG, HO YOUNG
分类号 H01L21/324 主分类号 H01L21/324
代理机构 代理人
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