| 摘要 |
PURPOSE: A manufacturing method of itopride is provided to manufacture itopride with high purity and high yield without the generation of harmful gas. CONSTITUTION: A manufacturing method of itopride comprises a step of forming itopride in chemical formula 1 through a reaction of a compound in chemical formula 4, and a peracid group compound of R1C(=O)OOH under the presence of Lewis acid. In chemical formulas, R1 is a C1-6 alkyl group, a phenyl group, or a halogen-substituted phenyl group. The manufacturing method additionally comprises a step of forming itopride hydrochloride by reacting the itopride and hydrochloric acid. The Lewis acid comprises one or more kinds selected from a group consisting of ZnCl2, SnCl2, BF3 ether, BF3 etherate.
|
