| 摘要 |
<p>An electron beam apparatus is offered which can well detect backscattered electrons (22) or both kinds of backscattered electrons and secondary electrons if an electron detector (7) is disposed above an objective lens (6) in the apparatus. The electron beam apparatus has an electron beam source (1) for emitting an electron beam (21) accelerated by a given accelerating voltage, the objective lens (6) for focusing the electron beam (21) emitted from the beam source (1) onto a specimen (20), scan coils (5) for scanning the focused beam (21) over the specimen (20), and the electron detector (7) located above the objective lens (6) and provided with a hole permitting passage of the beam (21). The detector (7) has an electrode (9) for producing an electric field that attracts the electrons (22) produced from the specimen (20) in response to the electron beam (21) irradiation. Correction coils (4) for correcting deflection of the beam (21) caused by the electric field are located below the detector (7).
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