发明名称
摘要 <p>A multilayer structure with controlled internal stresses comprising, in this order, a first main layer (110a), at least a first constraint adaptation layer (130) in contact with the first main layer, at least a second stress adaptation layer (120) put into contact by adhesion with said first stress adaptation layer, and a second main layer (110b) in contact with the second stress adaptation layer, the first and second stress adaptation layers having contact stresses with the first and second main layers.Application to the realization of electronic circuits and membrane devices.</p>
申请公布号 JP4889154(B2) 申请公布日期 2012.03.07
申请号 JP20000599069 申请日期 2000.02.09
申请人 发明人
分类号 F16J3/02;H01L21/02;B81B3/00;B81C1/00;C23C14/06;C23C16/30;H01L21/18;H01L21/762;H01L27/12 主分类号 F16J3/02
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