Method for manufacturing a micromachined device and micromachined device made thereof

摘要

A method for manufacturing a micromachined device is disclosed, the method comprising providing a structural layer (101) of amorphous semiconductor material; defining a first region (111) and a second region (112) in the structural layer (101); providing a shielding layer (104) above the first region (111), thereby leaving the second region (112) unshielded; thereafter annealing the second region (112) of the structural layer (101) with a first fluence; thereafter removing the shielding layer (104); thereafter annealing the first region (111) and the second region (112) of the structural layer (101) with a second fluence, the second fluence being substantially smaller than the first fluence.