发明名称 |
APPARATUS AND METHOD FOR MANUFACTURING SILICON SUBSTRATE, AND SILICON SUBSTRATE |
摘要 |
<p>In a fabrication zone where a silicon ribbon 12 is manufactured from molten silicon under an inactive gaseous atmosphere, a fabrication belt conveyer (fabrication bed) 5 composed of a feeding substrate 11 is arranged. The substrate is supplied with molten silicon 2 from a crucible furnace through a rotating roller 3 which adjusts the molten silicon into a state suitable for fabrication. The substrate 11 is provided with a plurality of gas ejecting pores and gas evacuating pores for ejecting and evacuating a gas with respect to a silicon ribbon 4 being fabricated from the molten silicon 2 from below the silicon ribbon. While stably maintaining the fabricated silicon ribbon 4 on the gas by the dynamic pressure balanced state of the gas being ejected and the gas being evacuated, and while forming a coating on a silicon surface by a reactive material and the like contained in the gas, tensile stress is applied in direction parallel to the surface of the fabricated silicon ribbon 4 and a silicon ribbon 12 is fabricated.</p> |
申请公布号 |
EP2128088(A4) |
申请公布日期 |
2012.03.07 |
申请号 |
EP20080703609 |
申请日期 |
2008.01.22 |
申请人 |
KOJIMA, GEN;YOKOYAMA, HIROSHI |
发明人 |
KOJIMA, GEN;YOKOYAMA, HIROSHI;HAYASHI, YUTAKA |
分类号 |
C01B33/02;C30B11/00;C30B15/00;C30B15/30;C30B28/10;C30B29/06;H01L31/04;H01L31/18 |
主分类号 |
C01B33/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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