发明名称 Semiconductor device and method for producing the same
摘要 In a semiconductor device which has through holes in an end face, in which a semiconductor element is fixedly mounted on a face of a substrate which has a wiring pattern, which is conductive to the wiring portion formed in the through hole, in at least one face, in which electrodes of the semiconductor element are electrically connected to the wiring pattern, and in which the face of the substrate which has the semiconductor element is coated with a resin, the through hole has a through hole land with a width of 0.02 mm or more, which is conductive to the wiring portion, in a substrate face, and the wiring portion and the through hole land are exposed.
申请公布号 US8129273(B2) 申请公布日期 2012.03.06
申请号 US20100881616 申请日期 2010.09.14
申请人 YOSHIZAWA TETSUO;URAKAWA SHIN-ICHI;MIYAKE TAKASHI;CANON KABUSHIKI KAISHA 发明人 YOSHIZAWA TETSUO;URAKAWA SHIN-ICHI;MIYAKE TAKASHI
分类号 H01L21/44 主分类号 H01L21/44
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