发明名称 METHOD FOR FABRICATING CELL STRING AND NON-VOLATILE MEMORY DEVICE COMPRISING THE CELL STRING
摘要 <p>PURPOSE: A cell string and a method for manufacturing a nonvolatile memory device including the same are provided to increase the integration of a memory device by adopting a vertical cell string structure. CONSTITUTION: A plurality of semiconductor patterns(100) are formed on a semiconductor substrate(10). A source area(110) is formed in a contact area between the semiconductor substrate and the semiconductor pattern. A common source area(200) is formed on the semiconductor substrate between the plurality of semiconductor patterns. First to sixth interlayer dielectric layers(20a-20f) and first to sixth conductive layers(40a-40f) on both sides of the semiconductor pattern. A selection transistor includes a string selection transistor and a ground selection transistor.</p>
申请公布号 KR20120019204(A) 申请公布日期 2012.03.06
申请号 KR20100082471 申请日期 2010.08.25
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 NAKANISHI TOSHIRO;LEE, CHOONG MAN
分类号 H01L21/8247;H01L27/115 主分类号 H01L21/8247
代理机构 代理人
主权项
地址
您可能感兴趣的专利