发明名称 |
METHOD FOR FABRICATING CELL STRING AND NON-VOLATILE MEMORY DEVICE COMPRISING THE CELL STRING |
摘要 |
<p>PURPOSE: A cell string and a method for manufacturing a nonvolatile memory device including the same are provided to increase the integration of a memory device by adopting a vertical cell string structure. CONSTITUTION: A plurality of semiconductor patterns(100) are formed on a semiconductor substrate(10). A source area(110) is formed in a contact area between the semiconductor substrate and the semiconductor pattern. A common source area(200) is formed on the semiconductor substrate between the plurality of semiconductor patterns. First to sixth interlayer dielectric layers(20a-20f) and first to sixth conductive layers(40a-40f) on both sides of the semiconductor pattern. A selection transistor includes a string selection transistor and a ground selection transistor.</p> |
申请公布号 |
KR20120019204(A) |
申请公布日期 |
2012.03.06 |
申请号 |
KR20100082471 |
申请日期 |
2010.08.25 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
NAKANISHI TOSHIRO;LEE, CHOONG MAN |
分类号 |
H01L21/8247;H01L27/115 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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