发明名称 Plating apparatus and plating method
摘要 An apparatus that performs an electrolytic plating on a plating surface of a belt substrate is provided. The apparatus includes a plating tank, a conveyor device configured to carry a belt substrate through an interior of the plating tank, an immersed cathode power-supply section provided within the interior of the plating tank, an auxiliary cathode power-supply section provided within the interior of the plating tank, and short-circuit wiring configured to short-circuit the immersed cathode power-supply section to the auxiliary cathode power-supply section. A plating method for performing electrolytic plating on a plating surface of a belt substrate is provided. The method includes conveying the belt substrate through a plating tank, making the plating surface a cathode by contacting at least one of an immersed cathode power-supply section or an auxiliary cathode power-supply section with the belt substrate, and short-circuiting the immersed cathode power-supply section to the auxiliary cathode power-supply section.
申请公布号 US8128790(B2) 申请公布日期 2012.03.06
申请号 US20080182745 申请日期 2008.07.30
申请人 TACHI YASUAKI;SAWA SHIGEKI;KASUGA TOSHIYUKI;IBIDEN CO., LTD. 发明人 TACHI YASUAKI;SAWA SHIGEKI;KASUGA TOSHIYUKI
分类号 C25D17/00 主分类号 C25D17/00
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