Top plate for reactor for manufacturing semiconductor,申请号US201129389553F-传众专利搜索

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发明名称	Top plate for reactor for manufacturing semiconductor
摘要
申请公布号	USD655257(S1)	申请公布日期	2012.03.06
申请号	US201129389553F	申请日期	2011.04.13
申请人	HONMA MANABU;HISHIYA KATSUYUKI;TOKYO ELECTRON LIMITED	发明人	HONMA MANABU;HISHIYA KATSUYUKI
分类号		主分类号
代理机构		代理人
主权项
地址

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