发明名称 |
Variable resist protecting groups |
摘要 |
A method and system for patterning a substrate using a dual-tone development process is described. The method and system comprise using a resist material having a polymer backbone with a plurality of protecting groups attached thereto to improve process latitude and critical dimension uniformity for the dual-tone development process. |
申请公布号 |
US8129080(B2) |
申请公布日期 |
2012.03.06 |
申请号 |
US20090561001 |
申请日期 |
2009.09.16 |
申请人 |
FONSECA CARLOS A.;SOMERVELL MARK;SCHEER STEVEN;TOKYO ELECTRON LIMITED |
发明人 |
FONSECA CARLOS A.;SOMERVELL MARK;SCHEER STEVEN |
分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|