| 摘要 |
Provided are an electrode device and an apparatus for generating plasma. The electrode device for generating plasma includes: a planar member disposed to face a susceptor supporting a substrate and generating plasma between the substrate and the planar member; and a linear member providing a high frequency signal to the planar member via a plurality of feeding points that are electrically connected to the planar member and allowing admittance to be reduced as the linear member is closer to the feeding points on a path from supply points at which the high frequency signal is supplied to the linear member, to each of the feeding points, wherein the linear ember includes a connection unit, the connection unit including: a first member connecting two feeding points from among four feeding points disposed adjacent to one another in a straight line and is disposed to be separated from a plane that includes the straight line in which the feeding points are formed and forms a predetermined angle with the planar member; and a second member connecting two feeding points to which the first member is not connected, from among the four feeding points and is disposed symmetrical with the first member with respect to the plane that includes the straight line in which the feeding points are formed. |
