| 摘要 |
<p>PURPOSE: A substrate processing system is provided to maximize space efficiency by successively supplying each substrate to each process chamber in a process order by a stepping movement. CONSTITUTION: A main chamber(10) includes a plurality of openings(11) in a sidewall thereof. A plurality of process chambers(30) are located outside the opening of the main chamber. Sputter guns(32,33) are formed on both sides of the process chambers. A gate valve(G) is formed between the process chamber and the main chamber. A moving chamber is formed in the main chamber.</p> |
