发明名称 HALIDE REMOVING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a halide removing device which exactly removes halides such as hydrogen chloride and hydrogen fluoride from a raw material gas manufactured from biomass or waste to the very low concentration of at most several ppm. <P>SOLUTION: The halide removing device includes: a reaction vessel filled up with a halide absorbent (package 32) containing sodium aluminate; and a roughness removing agent feed hopper 22 which supplies the roughness removing agent of slaked lime or the like which absorbs the halides in the raw material gas so that the halides may become the low concentration of dozens of ppm at a flue 21 of the upstream side, wherein the raw material gas is circulated by dry type gas purification processed without lowering the upstream side gas temperature to below the dew point, and the halide is absorbed, thereby the halides in the raw material gas is removed to the very low concentration of at most several ppm. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012040557(A) 申请公布日期 2012.03.01
申请号 JP20110219326 申请日期 2011.10.03
申请人 CENTRAL RES INST OF ELECTRIC POWER IND 发明人 NUNOKAWA MAKOTO;KOBAYASHI MAKOTO
分类号 B01D53/14;B01J20/08;C10K1/30 主分类号 B01D53/14
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