| 摘要 |
<P>PROBLEM TO BE SOLVED: To achieve a mold for an optical element having a nanostructure of nano-order micro-irregularities on a surface of a substrate, an optical element for a sensing chip including the nanostructure, and an optical element for fluorescence measurement including the nanostructure. <P>SOLUTION: One or more etching transfer layers 3 are formed on a substrate 2. A thin film 4 for hemispherical fine particle formation is formed on the etching transfer layer 3. Aggregation, decomposition, or nucleation is allowed to take place in a material constituting the thin film 4 by taking advantage of any of a thermal reaction, a photoreaction, and a gas reaction, or a complex reaction of these reactions, thereby a plurality of hemispherical island-shaped fine particles 5 are formed. The etching transfer layer 3 and the substrate 2 are sequentially etched by a reactant gas using the plurality of island-shaped fine particles 5 as a protective mask to form a fine conical pattern on the substrate 2 and thus to manufacture a mold 1 for an optical element having micro-irregularities (nanostructure mold face) 1' on a surface of the substrate 2. <P>COPYRIGHT: (C)2012,JPO&INPIT |
