A method of forming a Micro-Electro-Mechanical System (MEMS) includes forming a lower electrode on a first insulator layer within a cavity of the MEMS. The method further includes forming an upper electrode over another insulator material on top of the lower electrode which is at least partially in contact with the lower electrode. The forming of the lower electrode and the upper electrode includes adjusting a metal volume of the lower electrode and the upper electrode to modify beam bending.
申请公布号
WO2011160985(A3)
申请公布日期
2012.03.01
申请号
WO2011EP59880
申请日期
2011.06.15
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION;IBM UNITED KINGDOM LIMITED;STAMPER, ANTHONY;JAHNES, CHRISTOPHER, VINCENT