发明名称 RADICAL SOURCE AND MOLECULAR BEAM EPITAXY APPARATUS
摘要 [Objective] To attain a radical source whereby high-density radicals can be generated. [Solution] A radical source has: a supplying tube (10) comprising SUS; and a cylindrical plasma generating tube (11) comprising pyrolytic boron nitride (PBN), and which is connected to the supplying tube (10). The radical source has a cylindrical CCP electrode (13) arranged at the outer side of the plasma generating tube (11), and comprises a coil (12) wound along the outer circumference of the plasma generating tube (11), at the down stream side of the CCP electrode (13). A parasitic-plasma prevention tube (15) comprising ceramics is inserted into an opening of the supplying tube (10) that is located at the connection point of the supplying tube (10) and the plasma generating tube (11).
申请公布号 WO2012026113(A1) 申请公布日期 2012.03.01
申请号 WO2011JP04684 申请日期 2011.08.24
申请人 NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY;NU ECO ENGINEERING CO., LTD.;KATAGIRI ENGINEERING CO., LTD.;HORI, MASARU;AMANO, HIROSHI;KANO, HIROYUKI;DEN, SHOJI;YAMAKAWA, KOJI 发明人 HORI, MASARU;AMANO, HIROSHI;KANO, HIROYUKI;DEN, SHOJI;YAMAKAWA, KOJI
分类号 H01L21/203;C23C14/24;C30B23/08;H05H1/24 主分类号 H01L21/203
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