| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for cleaning the inside of a immersion lithographic apparatus. <P>SOLUTION: In particular, cleaning fluid may be introduced into a space between a projection system and a substrate table of a lithographic apparatus by using a liquid supply system of the lithographic apparatus. Additionally or alternatively, a cleaning device may be installed on the substrate table, and an ultrasonic emitter may be provided to produce ultrasonic liquid. <P>COPYRIGHT: (C)2012,JPO&INPIT |
