发明名称 |
Circuit Apparatus Having a Rounded Differential Pair Trace |
摘要 |
A first artwork layer having a first adaptable-mask section allows a graded amount of light to pass into an underlying first photoresist layer. Subsequent to developing the first photoresist layer, the graded amount of light creates a rounded geometric void used as a mold or sidewall for the creation of at least a lower portion of a rounded trace. A dielectric layer is laminated upon the lower portion and a second artwork layer having an second adaptable-mask section allows a graded amount of light to pass into a second photoresist layer. Subsequent to developing the second photoresist layer, the graded amount of light creates a rounded geometric void used as a mold or sidewall for the creation of at least an upper portion of a rounded trace. The photoresist and dielectric layers are removed resulting in a circuit apparatus having a rounded differential pair trace.
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申请公布号 |
US2012048600(A1) |
申请公布日期 |
2012.03.01 |
申请号 |
US20100870072 |
申请日期 |
2010.08.27 |
申请人 |
DOYLE MATTHEW S.;KUCZYNSKI JOSEPH;SPLITTSTOESSER KEVIN A.;TOFIL TIMOTHY J.;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
DOYLE MATTHEW S.;KUCZYNSKI JOSEPH;SPLITTSTOESSER KEVIN A.;TOFIL TIMOTHY J. |
分类号 |
H05K1/03;B05D5/12;C25D7/00;G03F7/20;G06F17/50 |
主分类号 |
H05K1/03 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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