| 摘要 |
<P>PROBLEM TO BE SOLVED: To relate to a manufacturing method of a micromechanical device. <P>SOLUTION: The method of manufacturing the micromechanical device provides a substrate, and includes a first step of forming a first material layer on the substrate, a second step of forming a sacrifice layer on the first material layer, a third step of forming a second material layer on the sacrifice layer, a forth step of etching a part of the sacrifice layer by a dry etching method, and a fifth step of etching the rest of the sacrifice layer by a wet etching method, forming a clearance between the first material layer and the second material layer, and forming a protrusion on a surface of the second material layer opposed to the first material layer. <P>COPYRIGHT: (C)2012,JPO&INPIT |
