| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a light exposure parameter deciding device capable of improving size uniformity of a pattern, a light exposure system, a check system, and a light exposure parameter deciding method. <P>SOLUTION: A light exposure parameter deciding device comprises a simulation execution part 112 for executing a lithography simulation using light strength information and a predetermined light exposure parameter corresponding to a plurality of regions on a light exposure mask and calculating a prediction pattern shape; and an evaluation value calculation part 113 for calculating an evaluation value of the prediction pattern shape. The light exposure parameter deciding device 100 repeats change of the light exposure parameter, and execution of the lithography simulation using the changed light exposure parameter until the evaluation value falls in a predetermined tolerance, and allocates the light exposure parameter to the region. <P>COPYRIGHT: (C)2012,JPO&INPIT |
