| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a structure of an airtight and light-tight housing preventing complication of a whole system in a support section of an auxiliary optical system of a projection optical system of a microlithography system. <P>SOLUTION: A first optical element module 7 includes a first housing and at least a first optical element, and the first optical element is stored in the first housing and includes a first optical use region 10.7 that regulates a first optical axis 10.13 and is optically used. At least a single second optical element module 8 is provided adjacent to the first optical element module 7 and includes at least a single second optical element, and the second optical element regulates a second optical axis 10.14 of a projection optical unit 2. The first housing includes a first housing axis 3.2 and an external wall 3.3 extending in the circumferential direction with respect to the first optical axis 10.13, the first optical axis 10.13 is laterally deflected and is at least one of axes being inclined with respect to the first housing axis 3.2, and the first housing axis 3.2 is substantially in a same straight line with the second optical axis 8.3. <P>COPYRIGHT: (C)2012,JPO&INPIT |
