| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of simulating imaging performance of a lithographic process utilized to image a target design having a plurality of features. <P>SOLUTION: The method includes the steps of: determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and generating the simulated image utilizing the function, where the simulated image represents an imaging result of the target design for the lithographic process. In one given embodiment, the function for simulating spatial images with focus and dose (exposure) variations is defined as the following equation, where I<SB POS="POST">0</SB>represents image intensity at nominal focus and exposure, f<SB POS="POST">0</SB>represents nominal focus, f and ε represent actual focus-exposure levels at which the simulated image is calculated, and parameters "a" and "b" represent first order and second order derivative images with respect to focus change. <P>COPYRIGHT: (C)2012,JPO&INPIT |
