发明名称 CLEANING APPARATUS, CLEANING METHOD, EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a cleaning apparatus which is capable of removing foreign matter from an optical surface of an optical member by making a cleaning medium collide with the optical surface, and to provide an exposure apparatus, a cleaning method, an exposure method, and a method for manufacturing a device. <P>SOLUTION: The cleaning apparatus includes: an environment formation member 61 which is disposed opposite to at least a part of the optical surface of the optical member to form a cleaning space separated from an environment in a chamber; a cleaning medium spraying part 70 for spraying a cleaning medium on at least a part of the optical surface in the cleaning space; and a recovering part 72 for recovering the cleaning medium sprayed on the at least a part of the optical surface, and foreign matter removed from at least a part of the optical surface by the cleaning medium. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012043992(A) 申请公布日期 2012.03.01
申请号 JP20100184077 申请日期 2010.08.19
申请人 NIKON CORP 发明人 HAGIWARA TSUNEYUKI
分类号 H01L21/027;G03F1/50;G03F1/68 主分类号 H01L21/027
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