发明名称 METHOD FOR PROCESSING SUBSTRATE AND APPARATUS FOR PROCESSING SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for processing a substrate and an apparatus for processing the substrate, which can restrain or prevent a pattern from collapsing. <P>SOLUTION: A first hydrophobizing agent is supplied to a substrate to hydrophobize the surface of the substrate (S104). A solvent is then supplied to the substrate to replace the first hydrophobizing agent with the solvent (S107). Subsequently, a second hydrophobizing agent different from the first hydrophobizing agent is supplied to the substrate to replace the solvent with the second hydrophobizing agent and consequently the surface of the substrate is more hydrophobized (S108). Thereafter, the solvent is supplied to the substrate to replace the second hydrophobizing agent with the solvent (S109). Finally, the solvent is removed from the substrate and the substrate is dried (S110). <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012044065(A) 申请公布日期 2012.03.01
申请号 JP20100185415 申请日期 2010.08.20
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KIMURA MASAHIRO;KOJIMARU TOMONORI;EMOTO TETSUYA
分类号 H01L21/304;G02F1/13;G02F1/1333;G11B5/84;G11B7/26 主分类号 H01L21/304
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