| 摘要 |
A structure manufacturing method includes laminating a first film on a base material, selectively irradiating the first film with an energy ray depending on a position of a surface of the first film on the base material, to form a latent image of a pattern on the first film, laminating a second film on the surface of the first film, and supplying a developer to the second film and removing a removal target portion of the first film to be selectively removed along with the second film, thereby developing the pattern.
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