发明名称 LARGE-AREA DEPOSITION DEVICE FOR GAS-MIXING PREVENTION
摘要 Disclosed is a large-area deposition device for gas-mixing prevention. According to the present invention, since injection nozzles of a multi-tube structure are applied, the large-area deposition device for gas-mixing prevention enables each gas to be supplied to the different injection nozzles whereby the gases are uniformly mixed when being jetted in a chamber, such that the mixed gases are jetted to the inside of the chamber in a uniform manner. That is to say, the invention with a simple structure is capable of preventing the gases from being mixed before the gases flow into the inside of the chamber, and equally mixing the gases to uniformly jet the mixed gases to the inside of the chamber, thereby reducing costs. Further, since the injection nozzles jet the gases by vibrating in a horizontal direction, the gases are mixed more uniformly in such a manner that the mixed gases are jetted to a substrate inside the chamber in a more uniform manner, whereby the quality of films deposited on the substrate is improved. In addition, since the injection nozzles are repaired or cleaned by being separated from each other, maintenance works can be simply conducted.
申请公布号 WO2011149278(A3) 申请公布日期 2012.03.01
申请号 WO2011KR03855 申请日期 2011.05.26
申请人 TERASEMICON CORPORATION;LEE, KYUNG HO 发明人 LEE, KYUNG HO
分类号 H01L21/205 主分类号 H01L21/205
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