| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a gradation mask which is manufactured efficiently by a wet etching method without roughness in a shape of an edge of a light-shielding film. <P>SOLUTION: A gradation mask comprises: a transparent substrate; a light-shielding film formed pattern-like on the transparent substrate; and a semitransparent film formed pattern-like on the light-shielding film and the transparent substrate. Further, the gradation mask comprises: a transparent region in which the transparent substrate is exposed; a light-shielding region in which the light-shielding film is formed on the transparent substrate; and a semitransparent region in which only the semitransparent film is formed on the transparent substrate. The above problem is solved by providing the gradation mask where crystal structures of the light-shielding film and the semitransparent film are both columnar or granular. <P>COPYRIGHT: (C)2012,JPO&INPIT |
