PATTERN FORMATION METHOD, NANOIMPRINT MOLD AND TRANSFER BASE FOR NANOIMPRINT

摘要

PROBLEM TO BE SOLVED: To provide a pattern formation method ensuring the resin filling performance in the pattern of a mold and the mold releasability from a resin layer, and to provide a nanoimprint mold and a transfer base for nanoimprint each for use in nanoimprint transfer using the pattern formation method.

SOLUTION: A nanoimprint mold 1 comprises a substrate 2, a transfer shape part 3 located on one surface 2a of the substrate 2, and a wettability change layer 4 located at least on the transfer shape part 3. A decrease in contact angle to water due to irradiation with light of a first wavelength and an increase in contact angle to water due to irradiation with light of a second wavelength occur reversibly in the wettability change layer 4.

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