| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an MgO thin film excellent in crystallinity. <P>SOLUTION: The method for manufacturing an MgO thin film, includes a heating step and a deposition step to manufacture the MgO thin film on a ferromagnetic body. The heating step is performed at the temperature of 200°C or more, while the deposition step is performed by sputtering a target composed of MgO and MgF<SB POS="POST">2</SB>. In the target, the approximate charge amount of the MgF<SB POS="POST">2</SB>to the MgO is controlled between 2.3-7.0 atom%. Thereby, (100) the MgO thin film excellent in orientation and crystallinity can be manufactured. <P>COPYRIGHT: (C)2012,JPO&INPIT |
