发明名称 THERMAL PROCESSING APPARATUS
摘要 There is provided a thermal processing apparatus in which the outer shell of a vacuum insulation layer-forming structure has an increased buckling strength. The thermal processing apparatus 1 includes a cylindrical reaction tube 3, a boat 5 for holding wafers W, a heater 2 provided around the reaction tube 3, and a vacuum insulation layer-forming structure 10 provided around the heater 2. The vacuum insulation layer-forming structure 10 includes an inner shell 11 and an outer shell 12 which forms a vacuum insulation layer 10a between the outer shell 12 and the inner shell 11. The outer shell 12 is comprised of a thin plate having an undulating cross-sectional shape formed by plastic forming.
申请公布号 US2012052457(A1) 申请公布日期 2012.03.01
申请号 US201113196330 申请日期 2011.08.02
申请人 SAITO TAKANORI;NAKAJIMA MAKOTO;TOKYO ELECTRON LIMITED 发明人 SAITO TAKANORI;NAKAJIMA MAKOTO
分类号 F27B11/00 主分类号 F27B11/00
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