发明名称 Coating system, useful for physical vapor deposition, comprises substrate, which moves continuously or discontinuously through coating system, evaporation source, device for energy input, feeding device and condensate surfaces
摘要 <p>Coating system comprises: a substrate (1), which moves continuously or discontinuously through coating system; an evaporation source (3) opposite to a distance of the substrate; a device for the energy input into the evaporation source; a feeding device to the subsequent feeding of the coating material to be vaporized; and condensate surfaces for a vaporized coating material (4), which is not present on the substrate, where the condensate surface is formed by re-feeding of the coating material for predominant proportion of the vaporized coating material, which is not present on the substrate. An independent claim is also included for physical vapor deposition of a substrate at a distance from an evaporation source, comprising moving the substrate oppositely through the coating system, and vaporizing of the evaporation source by an energy input coating material toward the substrate, where the coating material is re-fed through the predominant part of the coating material condensation region located around the substrate and into the evaporation source and absorbs the coating material condensate, which is not deposited on the substrate.</p>
申请公布号 DE102010040044(A1) 申请公布日期 2012.03.01
申请号 DE20101040044 申请日期 2010.08.31
申请人 VON ARDENNE ANLAGENTECHNIK GMBH 发明人 FABER, JOERG, DR.;REINHOLD, EKKEHART
分类号 C23C14/54 主分类号 C23C14/54
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