| 摘要 |
<p>Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, (c) developing the exposed film with a developer containing an organic solvent, and (d) rinsing the developed film with a rinse liquid containing an organic solvent, which rinse liquid has a specific gravity larger than that of the developer.</p> |
| 申请人 |
FUJIFILM CORPORATION;ENOMOTO, YUICHIRO;TARUTANI, SHINJI;KAMIMURA, SOU;KATO, KEITA;FUJII, KANA |
发明人 |
ENOMOTO, YUICHIRO;TARUTANI, SHINJI;KAMIMURA, SOU;KATO, KEITA;FUJII, KANA |
