发明名称 DIMENSIONAL SILICA-BASED POROUS SILICON STRUCTURES AND METHODS OF FABRICATION
摘要 Methods of fabricating dimensional silica-based substrates or structures comprising a porous silicon layers are contemplated. According to one embodiment, oxygen is extracted from the atomic elemental composition of a silica glass substrate by reacting a metallic gas with the substrate in a heated inert atmosphere to form a metal-oxygen complex along a surface of the substrate. The metal-oxygen complex is removed from the surface of the silica glass substrate to yield a crystalline porous silicon surface portion and one or more additional layers are formed over the crystalline porous silicon surface portion of the silica glass substrate to yield a dimensional silica-based substrate or structure comprising the porous silicon layer. Embodiments are also contemplated where the substrate is glass-based, but is not necessarily a silica-based glass substrate. Additional embodiments are disclosed and claimed.
申请公布号 WO2012027121(A2) 申请公布日期 2012.03.01
申请号 WO2011US47367 申请日期 2011.08.11
申请人 CORNING INCORPORATED;BELLMAN, ROBERT A;BORRELLI, NICHOLAS F;DENEKA, DAVID A.;O'MALLEY, SHAWN M;SCHNEIDER, VITOR M 发明人 BELLMAN, ROBERT A;BORRELLI, NICHOLAS F;DENEKA, DAVID A.;O'MALLEY, SHAWN M;SCHNEIDER, VITOR M
分类号 C25D11/32 主分类号 C25D11/32
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