发明名称 COMPOUND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A compound semiconductor device includes a substrate; a compound semiconductor layer formed over the substrate; and a gate electrode formed over the compound semiconductor layer with a gate insulating film arranged therebetween. The gate insulating film includes a first layer having reverse spontaneous polarization, the direction of which is opposite to spontaneous polarization of the compound semiconductor layer.
申请公布号 US2012049180(A1) 申请公布日期 2012.03.01
申请号 US201113096187 申请日期 2011.04.28
申请人 YAMADA ATSUSHI;FUJITSU LIMITED 发明人 YAMADA ATSUSHI
分类号 H01L29/22;H01L21/335;H01L21/44;H01L27/06;H01L29/20;H01L29/78 主分类号 H01L29/22
代理机构 代理人
主权项
地址