Material for Manufacturing Targets for Physical Vapor Deposition of P-Type Transparent Conductive Films

摘要

The invention describes a powderous oxide material (MxM′y)Cu2+a O2+b for the production of targets for p-type transparent conductive thin films, wherein −0.2≦̸a≦̸0.2, −0.2≦̸b≦̸0.2 and either —M′ is Sr and M is either one or both of Ba and bivalent Cu, with x>0, y>0 and x+y=1 ±0.2; or —M is bivalent Cu, x=1 ±0.2, and y=0.