| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and a device each detecting a compensation value of changes of device condition to be changed by potential measurement on a surface of a sample by using charged particle beams or sample charging, while suppressing potential changes of the sample induced by irradiation of the charged particle beams. <P>SOLUTION: For achieving above purposes, each of a method and a device applies, in a state in which charged particle beams are applied onto a sample, voltage to the sample so as to get a state (hereinafter referred to as a mirror state) in which the charged particle beams do not reach the sample, and detects information about the sample potential by using signals obtained at that time. <P>COPYRIGHT: (C)2012,JPO&INPIT |
