发明名称 PEELING SYSTEM, PEELING METHOD, AND COMPUTER STORAGE MEDIUM
摘要 <p>A peeling station of a peeling system comprises: a peeling apparatus for peeling a superimposed substrate; a first washing apparatus for washing a substrate to be processed that was peeled off; a second conveying apparatus for conveying the substrate to be processed between the peeling apparatus and the first washing apparatus; and a second washing apparatus for washing a support substrate that was peeled off. The second conveying apparatus comprises: a support plate that supports a joining face of the substrate to be processed, and upon which is formed a supply opening for supplying washing liquid to the joining face of the substrate to be processed; a holding member for holding a non-joining face of the substrate to be processed; and a reversing mechanism for reversing the front/back faces of the support substrate, and the substrate to be processed supported by the holding member.</p>
申请公布号 WO2012026262(A1) 申请公布日期 2012.03.01
申请号 WO2011JP66941 申请日期 2011.07.26
申请人 TOKYO ELECTRON LIMITED;HIRAKAWA, OSAMU;YOSHITAKA, NAOTO;MATSUNAGA, MASATAKA;OKAMOTO, NORIHIKO 发明人 HIRAKAWA, OSAMU;YOSHITAKA, NAOTO;MATSUNAGA, MASATAKA;OKAMOTO, NORIHIKO
分类号 H01L21/02;H01L21/304;H01L21/677;H01L27/12 主分类号 H01L21/02
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