| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a microprocessing method of a sample which is capable of achieving processing in nanometer order accuracy without damaging the sample regardless of conductive/insulating properties of the sample, superior in efficiency compared with an conventional method, and capable of shortening processing time and simplifying processing. <P>SOLUTION: Under an ultra-high vacuum, a high electric field is formed at a to-be-worked part of the sample having a sample multi-layer film structure, and the to-be-worked part is irradiated with a laser beam 13 to perform photoexcitation field evaporation, thereby performing microprocessing without damaging an atomic structure of the sample. At this time, it is desirable that an electrode having a pinhole 12 acting as a course of a laser beam is used as an electrode 11a for forming the high electric field. It is desirable to irradiate a pulse laser beam through an optical fiber. Further, it is desirable that the pulse laser beam is used as a laser beam. <P>COPYRIGHT: (C)2012,JPO&INPIT |
