发明名称 |
TOPCOAT COMPOSITION COMPRISING A POLYMER CONTAINING A REPEAT UNIT INCLUDING A SULFONAMIDE FUNCTION, PHOTORESIST COMPOSITION CONTAINING THE SAME AND METHODS OF USE |
摘要 |
Provided are sulfonamide-containing compositions, topcoat polymers, and additive polymers for use in lithographic processes that have improved static receding water contact angles over those known in the art. The sulfonamide-containing topcoat polymers and additive polymers of the present invention include sulfonamide-substituted repeat units with branched linking group as shown in Formula (I). |
申请公布号 |
WO2011101259(A3) |
申请公布日期 |
2012.03.01 |
申请号 |
WO2011EP51564 |
申请日期 |
2011.02.03 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION;IBM UNITED KINGDOM LIMITED;CENTRAL GLASS CO LTD;SANDERS, DANIEL, PAUL;FUJIWARA, MASAKI;TERUI, YOSHIHARU |
发明人 |
SANDERS, DANIEL, PAUL;FUJIWARA, MASAKI;TERUI, YOSHIHARU |
分类号 |
G03F7/11;G03F7/004;G03F7/038;G03F7/039;G03F7/20 |
主分类号 |
G03F7/11 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|